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商标
Trademark | 状态 |
---|---|
AERIS | ® |
Aeris analytical. | ® |
(ASD INC)标志 | ® |
archimedes. | ® |
轴 | ® |
Bohlin | ™ |
奇战 | ® |
克里斯斯 | ® |
CUBIX. | ® |
Cubix3(SuperIndex 3) | ® |
德科尔斯 | ™ |
EAGON | ® |
Eagon 2 | ® |
简单的撒克塞 | ® |
empyrean. | ® |
埃斯利昂 | ® |
epsilon x-flow | ® |
EXPERT SAXS | ® |
简单的撒克塞 | ® |
FieldSpec. | ® |
FIPA | ® |
荧光 | ® |
GALIPIX 3D | ® |
双子座 | ™ |
goLab | ™ |
手持式2. | ™ |
高分 | ® |
水底 | ™ |
iCore | ™ |
(i logo) | ® |
Indico Pro | ™ |
Insitec. | ® |
(Insitec logo) | ® |
(Insitec测量系统标识) | ® |
ISys | ® |
Labsizer | ™ |
LabSpec | ® |
莱内诺 | ® |
杰克斯 | ™ |
杰克斯-12 | ™ |
m3 pals. | ™ |
M4 | ™ |
MADLS | ® |
Malvern | ® |
(三角山Logo + Malvern Instruments) | ® |
汉字的马尔曼 | ® |
Malvern Instruments | ® |
Malvern Instruments in Chinese characters | ® |
Malvern Link | ™ |
(Malvern Plus Hills Logo) | ® |
Mastersizer | ® |
雄姐大师2000. | ™ |
MC (stylised) | ® |
MDRS | ® |
Microcal | ® |
形态学 | ® |
(三角山标志) | ® |
Nanosight | ® |
尖端 | ™ |
油痕 | ® |
奥尼亚人 | ® |
omnisec. | ® |
概要 | ® |
概要LOGO (picture) | ® |
PANTOS. | ® |
PEAQ-ITC | ® |
PIXCEL | ® |
PIXCEL 1D | ® |
PIXCEL 3D | ® |
QualitySpec | ® |
(r徽标) | ® |
(Realogica徽标) | ® |
Spraytec | ™ |
SST | ® |
sst-max. | ® |
超锋利管 | ® |
stratos. | ® |
超级Q. | ® |
Synirgi. | ® |
Terpaspec. | ® |
TheOx® Advanced | ® |
超声器 | ® |
金星Minilab. | ® |
ViewSpec | ™ |
Viscogel | ® |
Viscotek | ® |
X’CELERATOR | ® |
Xpert3(SuperIndex 3) | ® |
Zetasizer. | ® |
硝酸 | ® |
ZS Helix | ® |
专利
Malvern Panalytical has a range of unique, market leading, products that are protected by the following patent and patent applications
Mastersizer
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
EP1167946B1 (GB, FR, DE60135521D1) | 样品处理系统 | Hydro MV,Hydro LV, Hydro EV |
GB2364774B. US6800251B2. |
样品处理系统for use in a particle characterisation apparatus | Hydro MV,Hydro LV |
GB2494735B. | 通过光散射测量粒度分布的装置 | MS3000,MS3000E. |
CN104067105B EP2756283B1(GB,FR,DE602012015707.0) US9869625B2 JP6154812B |
Apparatus and method for measuring particle-size distribution by light scattering | MS3000,MS3000E. |
US10837889B2 GB2494734B. |
Apparatus and method for measuring particle-size distribution by light scattering | MS3000,MS3000E. |
Zetasizer.
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US7217350B2 |
表面充电产生的流动性和效应 | zetasizer推进范围,纳米zs,纳米z,纳米zs90,纳米zsp,螺旋 |
EP2467701A1 CN102575984B. US9279765B2 JP5669843B2 US10317339B2 US20200096443A1 |
改进单散射模式检测的复杂流体的动态光散射微型学 | Zetasizer推进范围,纳米ZSP,螺旋 |
CN103608671B CN105891304B EP2721399B1(如,CH + LI,DK,FR,GB,NL,DE602012031338.2,IT502017000050268) JP06023184B2 US9829525B2 US10274528B2 US20200072888A1 |
表面电荷测量 | Zeta板电池配件 |
US8702942B2 CN103339500B. EP2652490B1(GB,FR,DE602011046775.1) JP06006231B2 JP06453285B2 US10648945B2 |
使用扩散屏障激光多普勒电泳 | Zetasizer推进范围,纳米ZS,纳米S,纳米ZS90,S90,纳米ZSP |
EP2742337B1 (GB, FR, DE602012018122.2) US9816922B2 |
颗粒的双模表征 | Zetasizer.Helix |
US10197485B2 US10520412B2. US10845287B2 EP3353527A1 JP2018535429A CN108291861A |
粒子表征 | Zetasizer推进范围 |
US10119910B2 | 粒子表征instrument | Zetasizer推出:超级和专业人士 |
US8675197B2 JP6059872B2 EP2404157B1. |
粒子表征 | Zetasizer推进配件 |
EP3521806A1 US20210063295A1 CN111684261A WO2019154882A1 |
多角度动态光散射 | Zetasizer推出:超级 |
Insitec.
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US7418881B2 EP1592957B1 (GB) |
稀释系统和方法 | Insitec(一些产品) |
US7871194B2 EP1869429A2 |
稀释系统和方法 | Insitec(一些产品) |
EP2640499B1(GB) | 在线分散器和粉末混合方法 | Insitec Dry. |
形态学
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
EP2106536B1 (GB, FR, DE602008039489.1) US8111395B2. US8564774B2 |
偏强性的光谱调查 | 形态学G3-ID |
GB2522735B. JP6560849B2 |
Method and Apparatus for Powder Dispersion | 形态学G3-ID, Morphologi G3 |
粘液器
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US2018067901A1 JP2018511129A EP3274864A1 CN107430593A |
Multi-Component Model Parameterisation | 粘液器TD. |
Hydro Sight
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US8456633B2 | 光谱过程监测 | Hydro Sight |
CN104704343B EP2864760A2 US10509976B2. |
异质流体样本表征 | Hydro Sight |
纳米典
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US7751053B2 JP04002577B2 EP1499871B1 (FR, DE60335872.1) GB2388189B. US7399600B2 |
用于分析粒子的光学检测 | 纳米典NS300 Nanosight NS500. 纳米典LM10 |
EP3071944B1(GB,FR,DE602014059002.0) US9909970B2. JP6505101B2 CN105765364A |
仪器校准的改进或有关的改进 | 纳米典NS300 |
MicroCal ITC
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
CN101855541B EP2208057A1 JP05542678B2 US8449175C1 US8827549C1 |
等温滴定微量电流仪装置和使用方法 | 微量ITC系列 |
CN102232184B. EP2352993B1 (CH+LI, GB, FR, DE602009044685.1) JP5476394B2 US9103782B2 US9404876B2 US10036715B2 US10254239B2 EP3144666B1(CH + LI,GB,FR,DE602009059932.1) US20200025698A1 EP3647776A1 |
Automatic Isothermal Titration Microcalorimeter Apparatus and method of Use | 微量ITC系列 |
微量DSC.
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US8635045B2 CN103221808B. EP2646811A1 IN336472 JP5925798B2 |
在量热数据中自动峰值发现的方法 | 微量DSC.Range |
omnisec.
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US9759644B2 US10551291B2 |
Balanced Capillary Bridge Viscometer | omnisec. |
US9612183B2 EP2619543B1 (GB, FR, DE602011011174.4) JP05916734B2 CN103168223B 在341558 |
模块化毛细管桥粘度计 | omnisec. |
站立XRF.
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US8210000B2 JP5554163B2 CN101941789B. EP2270410B1(GB,FR,NL,DE602009003389.1) |
珠炉 | Zetium Axios FAST epsilon5. |
US6823043B2 | Determination of material parameters |
Zetium* Axios FAST* 2830 ZT(晶圆分析仪)* epsilon5.* Semyos.* |
US7949092B2 |
执行X射线分析的装置和方法 |
Zetium* Axios FAST* 2830 ZT(晶圆分析仪)* epsilon5.* Semyos. |
US6574305B2 |
Device and method for the inspection of the condition of a sample | Zetium* Axios FAST* 2830 ZT(晶圆分析仪)* epsilon5.* Semyos.* |
JP4111336B2 | 用X射线测试样品的装置 |
epsilon5. |
US7042978B2 | Examination of material samples | Zetium* Axios FAST* epsilon5. Semyos.* |
JP5782451B2 EP2510397B1 (GB, FR, NL, DE602010021859.7) |
用横向图案制造多层结构的方法,用于在XUV波长范围内应用,以及根据该方法制造的BF和图像结构 | Zetium* Axios FAST 2830 ZT(晶圆分析仪)* epsilon5.* Semyos.* |
US9658352B2 CN104833557B JP656263B2 JP6804594B2 |
制作标准的方法 | Zetium Axios FAST |
EP2787342B1(GB,FR,NL,DE602013028642.6) JP6360151B2 |
Preparation of sample-pellets by pressing | Zetium Axios FAST |
US10107551B2 EP2966039B1(GB,FR,NL,DE602014024004.2) JP6559486B2 CN105258987B |
使用助熔剂和铂坩埚制备XRF的样品 | Zetium Axios FAST |
US9784699B2 JP6861469B2 CN105937890B EP3064931B1(GB,FR,NL,CH,DE) |
Quantitative X-ray Analysis - Matrix thickness correction | Zetium* Axios FAST |
US9739730B2 JP6706932B2 CN105938113B EP3064933B1 (GB, FR, NL, CH, DE) |
定量X射线分析 - 多光路仪器 | Zetium* Axios FAST |
US9851313B2 JP6762734B2 CN105938112B EP3064932B1(GB,FR,NL,CH + LI,DE602016024126.9) |
Quantitative X-ray Analysis - Ratio correction | Zetium* Axios FAST |
JP3936912B2 | 具有浮动盖的样品容器,用于液体X射线分析 | Zetium Axios FAST 2830 ZT (wafer analyser) epsilon5. Semyos. |
US9239305B2 | 样本持有人 | Zetium* Axios FAST* epsilon5. |
US7978820B2 |
X-ray diffraction and fluorescence | Zetium Axios FAST* 2830 ZT(晶圆分析仪)* epsilon5.* Semyos.* |
US7720192B2. JP5574575B2 CN101311708B |
x射线荧光仪 | Zetium* Axios FAST* 2830 ZT(晶圆分析仪)* epsilon5.* Semyos.* |
US7194067B2. |
X射线光学系统 | Zetium Axios FAST* 2830 ZT(晶圆分析仪)* epsilon5.* Semyos.* |
US8223923B2 JP5266310B2 CN101720491B EP1983547B1(GB,FR,NL,DE602008000361D1) |
带金属线阴极的X射线源 | Zetium Axios FAST 2830 ZT (wafer analyser) epsilon5. Semyos. |
US9911569B2 JP2016131150A CN105810541B EP3043371B2(GB,FR,NL,DE602015012421.9) |
X射线管阳极布置 |
Zetium Axios FAST 2830 ZT (wafer analyser) epsilon5. Semyos. |
US10281414B2 EP3330701B1 (CH+LI, GB, FR, NL, DE602017006751.2) EP3480587A1 US10393683B2 JP6767961B2 CN108132267A |
Conical collimator for X-ray measurements | Zetium* |
*·产品可选/不是标准品 |
Benchtops XRF
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US8210000B2 JP5554163B2 CN101941789B. EP2270410B1(GB,FR,NL,DE602009003389.1) |
珠炉 | epsilon 1系列 epsilon 3x光谱仪 epsilon 4空质量版 |
US6823043B2 | Determination of material parameters |
epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US7949092B2 |
执行X射线分析的装置和方法 |
epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US6574305B2 |
Device and method for the inspection of the condition of a sample | epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US7042978B2 | Examination of material samples | epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US9658352B2 CN104833557B JP6562635B2 JP6804594B2 |
制作标准的方法 | epsilon 1系列 epsilon 3x光谱仪 epsilon 4空质量版 |
EP2787342B1(GB,FR,NL,DE602013028642.6) JP6360151B2 |
Preparation of sample-pellets by pressing | epsilon 1系列 epsilon 3x光谱仪 epsilon 4空质量版 |
US10107551B2 JP6559486B2 CN105258987B EP2966039B1(GB,FR,NL,DE602014024004.2) |
使用助熔剂和铂坩埚制备XRF的样品 | epsilon 1系列 epsilon 3x光谱仪 epsilon 4空质量版 |
US9784699B2 JP6861469B2 CN105937890B EP3064931B1(GB,FR,NL,CH,DE) |
Quantitative X-ray Analysis - Matrix thickness correction | epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US9739730B2 JP6706932B2 CN105938113B EP3064933B1(GB,FR,NL,CH,DE602016056347.9) |
定量X射线分析 - 多光路仪器 | epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US9851313B2 JP6762734B2 CN105938112B EP3064932B1(GB,FR,NL,CH + LI,DE602016024126.9) |
Quantitative X-ray Analysis - Ratio correction | epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
JP3936912B2 | 具有浮动盖的样品容器,用于液体X射线分析 | epsilon 1系列 epsilon 3x光谱仪 epsilon 4空质量版 |
US9239305B2 | 样本持有人 | epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US9547094B2 CN104849295B. EP2908127B1 (CH+LI, GB, FR, NL, DE602014011398.2) JP6526983B2 |
X-ray analysis apparatus |
epsilon 1系列 epsilon 3x光谱仪 epsilon 4空质量版 |
US7978820B2 |
X-ray diffraction and fluorescence | epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US7194067B2. |
X射线光学系统 | epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US8223923B2 JP5266310B2 CN101720491B EP1983547B1(GB,FR,NL,DE602008000361D1) |
带金属线阴极的X射线源 | epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
US9911569B2 JP2016131150A CN105810541B EP3043371B2(GB,FR,NL,DE602015012421.9) |
X射线管阳极布置 |
epsilon 1系列* epsilon 3x光谱仪* epsilon 4空质量版* |
* Optional / not standard in product |
站立XRD
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US6815684B2 |
Analytical X-ray apparatus provided with a solid state position sensitive X-ray detector | Empyrean X'Pert³ Powder X'Pert³ MRD (XL) Cubix‖系列 |
US6823043B2 | Determination of material parameters |
Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US6574305B2 |
Device and method for the inspection of the condition of a sample | Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US9506880B2 CN104251870B. EP2818851A1 JP6403452B2 |
Diffraction imaging | Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US7116754B2 | 衍射仪 | Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US8488740B2. JP6009156B2. CN102565108B EP2455747B1(GB,FR,NL,DE602011022779.3) |
衍射仪 |
Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US7858945B2 JP5254066B2 CN101521246B EP2088451B1(GB,FR,NL,DE602008041760.3) |
成像探测器 | Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
EP2088625B1(GB,FR,NL,CH + LI,DE602009040563.2) | 成像探测器 | Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US9110003B2 CN103383363B EP2634566B1 (GB, FR, NL, DE602012058202.2) JP6198406B2 |
Microdiffraction. |
Empyrean X'Pert³ Powder X'Pert³ MRD (XL) Cubix‖系列 |
US6704390B2 |
X-ray analysis apparatus provided with a multilayer mirror and an exit collimator | Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US9640292B2 CN104777179B. EP2896960B1 (GB, FR, NL, DE602014012155.1) JP6564683B2 |
X射线设备 |
Empyrean X'Pert³ Powder Cubix‖系列 |
US7756248B2 JP5145263B2 CN101545873B EP2090883B1(GB,FR,NL,DE602008002143D1) |
包装中的X射线检测 |
Empyrean X'Pert³ Powder X'Pert³ MRD (XL) |
US8477904B2 JP5752434B2 CN102253065B EP2365319B1(GB,FR,NL,DE602011055847.1) |
X-ray diffraction and computed tomography | Empyrean X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US7542547B2 JP5280057B2 CN101256160B. EP1947448B1(CH + LI,GB,FR,NL,DE602007031351.1) |
用于X射线散射的X射线衍射设备 |
X'Pert³ Powder* x'pert³mrd(xl)* |
EP1287342B1(GB,FR,DE60147121.0) | X射线衍射仪 | Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US7477724B2 EP1703276B1 (GB, FR, NL, DE602005033962.0) |
X射线仪器 | Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列 |
US7194067B2. |
X射线光学系统 | Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
US8437451B2 JP5999901B2 CN102610290B EP2477191B1(CH + LI,GB,FR,NL,DE602011035906.1) |
X-ray shutter arrangement | Empyrean X'Pert³ Powder X'Pert³ MRD (XL) Cubix‖系列 |
US9911569B2 JP2016131150A CN105810541B EP3043371B1(GB,FR,NL,DE602015012421.9) |
X射线管阳极布置 |
Empyrean* X'Pert³ Powder* x'pert³mrd(xl)* Cubix‖系列* |
EP3553508A2 US20190317030A1 JP2019184609A CN110389142A |
X-ray analysis apparatus and method | Empyrean* |
US10359376B2 EP3273229A1 JP6701133B2 CN107643308A |
样本持有人for X-ray analysis | Empyrean* |
* Optional / not standard in product |
QualitySpec 7000.
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US8164747B2 CA2667650C EP2092296B1 (CH+LI, NL, SE, DK, DE602007045593.6) |
Apparatus, system and method for optical spectroscopic measurements | QualitySpec 7000. |
Terpaspec.Halo
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US9207118B2. | Apparatus, system and method for scanning monochromator and diode array spectrometer instrumentation | Terpaspec.Halo |
QualitySpec Trek.
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US9207118B2. | Apparatus, system and method for scanning monochromator and diode array spectrometer instrumentation | QualitySpec Trek. |
台式XRD
Patent Numbers | 专利冠军 | 仪器 |
---|---|---|
US6815684B2 |
Analytical X-ray apparatus provided with a solid state position sensitive X-ray detector | Aeris * |
US6823043B2 | Determination of material parameters |
Aeris * |
US9506880B2 CN104251870B. EP2818851A1 JP6403452B2 |
Diffraction imaging | Aeris * |
US7116754B2 | 衍射仪 | Aeris * |
US8488740B2. JP6009156B2. CN102565108B EP2455747B1(GB,FR,NL,DE602011022779.3) |
衍射仪 | Aeris * |
US7858945B2 JP5254066B2 CN101521246B EP2088451B1(GB,FR,NL,DE602008041760.3) |
成像探测器 | Aeris * |
EP2088625B1(CH + LI,GB,FR,NL,DE602009040563.2) | 成像探测器 | Aeris * |
US6704390B2 |
X-ray analysis apparatus provided with a multilayer mirror and an exit collimator | Aeris * |
US9640292B2 JP6564572B2 CN104777179B. EP2896960B1 (GB, FR, NL, DE602014012155.1) |
X射线设备 | Aeris |
US8477904B2 JP5752434B2 CN102253065B EP2365319B1(GB,FR,NL,DE602011055847.1) |
X-ray diffraction and computed tomography | Aeris * |
US7542547B2 JP5280057B2 CN101256160B. EP1947448B1(CH + LI,GB,FR,NL,DE602007031351.1) |
用于X射线散射的X射线衍射设备 |
Aeris * |
EP1287342B1(GB,FR,DE60147121.0) | X射线衍射仪 | Aeris * |
US7477724B2 EP1703276B1 (GB, FR, NL, DE602005033962.0) |
X射线仪器 | Aeris * |
US7194067B2. |
X射线光学系统 | Aeris * |
US8437451B2 JP5999901B2 CN102610290B EP2477191B1(CH + LI,GB,FR,NL,DE602011035906.1) |
X-ray shutter arrangement | Aeris |
US9911569B2 JP2016131150A CN105810541B EP3043371B1(GB,FR,NL,DE602015012421.9) |
X射线管阳极布置 |
Aeris * |
* Optional / not standard in product |